International Conference on Phenomena in Ionized Gases (ICPIG)BORDAGE, Marie-Claude; GLEIZES, Alain.Journal de physique. IV. 1997, Vol 7, Num 4, issn 1155-4339, 430 p.Conference Proceedings

DLC coating of interior surfaces of steel tubes by low energy plasma source ion implantation and depositionBABA, K; HATADA, R; FLEGE, S et al.Applied surface science. 2014, Vol 310, pp 262-265, issn 0169-4332, 4 p.Conference Paper

Plasma needle for in vivo medical treatment : recent developments and perspectivesSTOFFELS, E; KIEFT, I. E; SLADEK, R. E. J et al.Plasma sources science & technology (Print). 2006, Vol 15, Num 4, issn 0963-0252, S169-S180Conference Paper

External circuit system effects on chlorine plasma instabilitiesELLINGBOE, A. R; LAW, V. J; SOBERON, F et al.Electronics Letters. 2005, Vol 41, Num 9, pp 525-526, issn 0013-5194, 2 p.Article

International Workshop on Plasma Sources and Surface Interactions in Materials ProcessingSUGAI, Hideo.Plasma sources science & technology (Print). 1996, Vol 5, Num 2, issn 0963-0252, 229 p.Conference Proceedings

Inductive heating and E to H transitions in capacitive dischargesCHABERT, P; RAIMBAULT, J.-L; LEVIF, P et al.Physical review letters. 2005, Vol 95, Num 20, pp 205001.1-205001.4, issn 0031-9007Article

Plasmen : Träger neuartiger Verfahren und Designer-Werkzeug = Plasmas : they support new methods and become a tool for designersCONRADS, H.Metalloberfläche. 1995, Vol 49, Num 12, pp 959-963, issn 0026-0797Article

Les procédés plasmas et leurs développements industriels = Plasma processes and their industrial developmentsAMOUROUX, J.L' Actualité chimique (Paris. 1973). 1994, Num 3, pp 5-12, issn 0151-9093Article

Proposal of non-cylindrical and large-area RF plasma productions by surface waveNONAKA, S.Journal of the Physical Society of Japan. 1994, Vol 63, Num 8, pp 3185-3186, issn 0031-9015Article

m = ±1 and m = ±2 mode helicon wave excitationKIM, J.-H; YUN, S.-M; CHANG, H.-Y et al.IEEE transactions on plasma science. 1996, Vol 24, Num 6, pp 1364-1370, issn 0093-3813Article

Saubere Arbeit : Plasmen wirken oberflächentechnisch optimal = Clean work : plasmas produce optimal surface treatmentsMIRAU, A.Energie (München). 1995, Vol 47, Num 7-8, pp 42-44, issn 0013-7359Article

Investigation of the prospect for the design of transformer-type plasmotronsKOGAN, V. A; ULANOV, I. M.High temperature. 1993, Vol 31, Num 1, pp 129-135, issn 0018-151XArticle

Spectral enhancement of a Xe-based EUV discharge plasma sourceZUPPELLA, P; REALE, A; RITUCCI, A et al.Plasma sources science & technology (Print). 2009, Vol 18, Num 2, issn 0963-0252, 025014.1-025014.4Article

Operating characteristics of a 100 kV, 100 kW plasma ion implantation facilityMATOSSIAN, J. N; WEI, R.Surface & coatings technology. 1996, Vol 85, Num 1-2, pp 92-97, issn 0257-8972Conference Paper

rf plasma source using a magnetic line-cusp fieldYAMAUCHI, K; TAKAHASHI, K; YABE, E et al.Review of scientific instruments. 1993, Vol 64, Num 9, pp 2434-2439, issn 0034-6748Article

Structure of the plasma jet of a pulsed erosional electric-discharge sourceLEONOV, S. B; LUK'YANOV, G. A.Journal of applied mechanics and technical physics. 1994, Vol 35, Num 5, pp 653-657, issn 0021-8944Article

Super-wide electron cyclotron resonance plasma source excited by an independent double-slot antennaYOSHIKI, H; AMADATSU, S; ITADANI, K et al.Japanese journal of applied physics. 1997, Vol 36, Num 10A, pp L1347-L1350, issn 0021-4922, 2Article

The dispersion and matching characteristics of the helical resonator plasma sourceNIAZI, K; LICHTENBERG, A. J; LIEBERMAN, M. A et al.IEEE transactions on plasma science. 1995, Vol 23, Num 5, pp 833-843, issn 0093-3813Article

Direct current bias as on ion current monitor in the transformer coupled plasma etcherYUNJU RA; CHING-HWA CHEN.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 6, pp 2911-2913, issn 0734-2101Article

Atmospheric-pressure plasma sources for biomedical applicationsPARK, G. Y; PARK, S. J; CHOI, M. Y et al.Plasma sources science & technology (Print). 2012, Vol 21, Num 4, issn 0963-0252, 043001.1-043001.21Article

Continuous-flow, atmospheric-pressure microplasmas: a versatile source for metal nanoparticles synthesis in the gas or liquid phaseCHIANG, Wei-Hung; RICHMONDS, Carolyn; MOHAN SANKARAN, R et al.Plasma sources science & technology (Print). 2010, Vol 19, Num 3, issn 0963-0252, 034011.1-034011.8Conference Paper

Challenges and progress toward a 250 kV, 100 kW plasma ion implantation facilityMATOSSIAN, J. N; WEI, R.Surface & coatings technology. 1996, Vol 85, Num 1-2, pp 111-119, issn 0257-8972Conference Paper

Electron cyclotron resonance plasma reactor for cryogenic etchingAYDIL, E. S; GREGUS, J. A; GOTTSCHO, R. A et al.Review of scientific instruments. 1993, Vol 64, Num 12, pp 3572-3584, issn 0034-6748Article

INTRODUCTION A L'ETUDE DES IONS DEUX FOIS CHARGES AVEC UNE SOURCE DU TYPE CALUTRONURQUIDI FERNANDEZ M.1972; ; S.L.; DA. 1972; PP. 1-53; H.T. 18; BIBL. 2 P. 1/2; (THESE DOCT. 3EME CYCLE, SPEC. PHYS. PLASMA; UNIV. PARIS-SUD; 1972)Thesis

SUR LES EQUATIONS DECRIVANT UN PLASMA QUASI-NEUTRE D'IONS LOURDS CONFINE DANS UN CHAMP MAGNETIQUE. APPLICATIONS AUX SOURCES D'IONSTAUTH T.1973; NUCL. INSTRUM. METHODS; NETHERL.; DA. 1973; VOL. 107; NO 2; PP. 293-300; ABS. ANGL.; BIBL. 16 REF.Serial Issue